화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Influence of deposition rate on interface width of Mo/Si multilayers
Zhao JL, Yi K, Wang H, Fang M, Wang B, Hu GH, He HB
Thin Solid Films, 592, 256, 2015
2 Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth
Bosgra J, Verhoeven J, van de Kruijs RWE, Yakshin AE, Bijkerk F
Thin Solid Films, 522, 228, 2012
3 Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
de Rooij-Lohmann VITA, Yakshin AE, Zoethout E, Verhoeven J, Bijkerk F
Applied Surface Science, 257(14), 6251, 2011
4 Structure and interface properties of Mo/B4C/Si multilayers deposited by rf-magnetron sputtering
Patelli A, Ravagnan J, Rigato V, Salmaso G, Silvestrini D, Bontempi E, Depero LE
Applied Surface Science, 238(1-4), 262, 2004
5 Variation of the nucleation energy of molybdenum silicides as a function of the composition of an amorphous precursor
Johnson CD, Anderson K, Gromko AD, Johnson DC
Journal of the American Chemical Society, 120(21), 5226, 1998