검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system Liddle JA, Blakey MI, Bolan K, Farrow RC, Gallatin GM, Kasica R, Katsap V, Knurek CS, Li J, Mkrtchyan M, Novembre AE, Ocola L, Orphanos PA, Peabody ML, Stanton ST, Teffeau K, Waskiewicz WK, Munro E Journal of Vacuum Science & Technology B, 19(2), 476, 2001 |
| 2 |
SCALPEL mark detection using Si/SiO2 and 100 keV backscattered electrons Farrow RC, Mkrtchyan M, Kizilyalli IC, Waskiewicz WK, Hopkins LC, Alakan A, Gibson G, Brown P, Misra S, Trimble L Journal of Vacuum Science & Technology B, 19(5), 1852, 2001 |
| 3 |
Characterizing partial coherence uniformity in a deep ultraviolet step and repeat tool Watson GP, Cirelli RA, Mkrtchyan M, Travers RJ Journal of Vacuum Science & Technology B, 15(6), 2399, 1997 |
| 4 |
Precise Measurement of the Effective Backscatter Coefficient for 100-keV Electron-Beam Lithography on Si Watson GP, Berger SD, Liddle JA, Fetter LA, Farrow RC, Tarascon RG, Mkrtchyan M, Novembre AE, Blakey MI, Bolan KJ, Poli L Journal of Vacuum Science & Technology B, 13(6), 2535, 1995 |