검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Influence of partial charge on the material removal rate during chemical polishing Suratwala T, Steele R, Miller PE, Wong LN, Destino JF, Feigenbaum E, Shen N, Feit M Journal of the American Ceramic Society, 102(4), 1566, 2019 |
| 2 |
Nanoplastic removal function and the mechanical nature of colloidal silica slurry polishing Shen N, Feigenbaum E, Suratwala T, Steele W, Wong LN, Feit MD, Miller PE Journal of the American Ceramic Society, 102(6), 3141, 2019 |
| 3 |
Determining thickness and refractive index from free-standing ultrathin polymer films with spectroscopic ellipsometry Hilfiker JN, Stadermann M, Sun JN, Tiwald T, Hale JS, Miller PE, Aracne-Ruddle C Applied Surface Science, 421, 508, 2017 |
| 4 |
Nanoscratching of Optical Glass Surfaces Near the Elastic-Plastic Load Boundary to Mimic the Mechanics of Polishing Particles Shen N, Suratwala T, Steele W, Wong L, Feit MD, Miller PE, Dylla-Spears R, Desjardin R Journal of the American Ceramic Society, 99(5), 1477, 2016 |
| 5 |
Chemistry and Formation of the Beilby Layer During Polishing of Fused Silica Glass Suratwala T, Steele W, Wong L, Feit MD, Miller PE, Dylla-Spears R, Shen N, Desjardin R Journal of the American Ceramic Society, 98(8), 2395, 2015 |
| 6 |
HF-Based Etching Processes for Improving Laser Damage Resistance of Fused Silica Optical Surfaces Suratwala TI, Miller PE, Bude JD, Steele WA, Shen N, Monticelli MV, Feit MD, Laurence TA, Norton MA, Carr CW, Wong LL Journal of the American Ceramic Society, 94(2), 416, 2011 |