검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Two cryogenic processes involving SF6, O-2, and SiF4 for silicon deep etching Tillocher T, Dussart R, Overzet LJ, Mellhaoui X, Lefaucheux P, Boufnichel M, Ranson P Journal of the Electrochemical Society, 155(3), D187, 2008 |
| 2 |
Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas Sungauer E, Pargon E, Mellhaoui X, Ramos R, Cunge G, Vallier L, Joubert O, Lill T Journal of Vacuum Science & Technology B, 25(5), 1640, 2007 |
| 3 |
Oxidation threshold in silicon etching at cryogenic temperatures Tillocher T, Dussart R, Mellhaoui X, Lefaucheux P, Maaza NM, Ranson P, Boufnichel M, Overzet LJ Journal of Vacuum Science & Technology A, 24(4), 1073, 2006 |