화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Intelligent Model-Based Control-System Employing in-Situ Ellipsometry
Butler SW, Stefani J, Sullivan M, Maung S, Barna G, Henck S
Journal of Vacuum Science & Technology A, 12(4), 1984, 1994
2 High-Speed Spectral Ellipsometry for in-Situ Diagnostics and Process-Control
Duncan WM, Henck SA, Kuehne JW, Loewenstein LM, Maung S
Journal of Vacuum Science & Technology B, 12(4), 2779, 1994
3 Sensor Integration into Plasma Etch Reactors of a Developmental Pilot Line
Barna GG, Loewenstein LM, Brankner KJ, Butler SW, Mozumder PK, Stefani JA, Henck SA, Chapados P, Buck D, Maung S, Saxena S, Unruh A
Journal of Vacuum Science & Technology B, 12(4), 2860, 1994