검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Image placement issues for ITO-based step and flash imprint lithography templates Nordquist KJ, Ainley ES, Mancini DP, Dauksher WJ, Gehoski KA, Baker J, Resnick DJ, Masnyj Z, Mangat PJS Journal of Vacuum Science & Technology B, 22(2), 695, 2004 |
| 2 |
Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks Lu B, Wasson JR, Weisbrod EJ, Masnyj Z, Mangat PJS, Nordquist K, Resnick D Journal of Vacuum Science & Technology B, 20(6), 3029, 2002 |
| 3 |
Pattern placement correction methodology for 200 mm SCALPEL masks Ocola LE, Farrow RC, Kasica RJ, Caminos CG, Rutberg L, Fullowan RF, Teffeau K, Blakey MI, Peabody ML, Knurek CS, Bogart GR, Novembre AE, Liddle JA, Lercel M, Magg C, Collins K, Trybendis M, Cadwell N, Jeffer R, Dauksher WJ, Resnick DJ, Mancini D, Han SI, Masnyj Z, Smith K, Mangat PJS Journal of Vacuum Science & Technology B, 19(6), 2659, 2001 |
| 4 |
Inter and intramembrane resist critical dimension uniformity across a SCALPEL mask Nordquist K, Ainley E, Resnick DJ, Weisbrod E, Martin C, Engelstad R, Masnyj Z, Mangat P Journal of Vacuum Science & Technology B, 18(6), 3242, 2000 |