화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Compositional analysis of polycrystalline hafnium oxide thin films by heavy-ion elastic recoil detection analysis
Martinez FL, Toledano M, San Andres E, Martil I, Gonzalez-Diaz G, Bohne W, Rohrich J, Strub E
Thin Solid Films, 515(2), 695, 2006
2 Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method
Martinez FL, Ruiz-Merino R, del Prado A, San Andres E, Martil I, Gonzalez-Diaz G, Jeynes C, Barradas NP, Wang L, Reehal HS
Thin Solid Films, 459(1-2), 203, 2004
3 Rapid thermal annealing effects on the electrical behavior of plasma oxidized silicon/silicon nitride stacks gate insulators
San Andres E, del Prado A, Martil I, Gonzalez-Diaz G, Martinez FL
Journal of Vacuum Science & Technology B, 21(4), 1306, 2003
4 Characterization of polycrystalline Cu(In,Ga)Te-2 thin films prepared by pulsed laser deposition
Gremenok VF, Martin RW, Bodnar IV, Yakushev MV, Schmitz W, Bente K, Martil I, Martinez FL, Zaretskaya EP, Victorov IA, Ermakov OV, Faunce CA, Pilkington RD, Hill AE, Tomlinson RD
Thin Solid Films, 394(1-2), 24, 2001
5 Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance
del Prado A, Martinez FL, Martil I, Gonzalez-Diaz G, Fernandez M
Journal of Vacuum Science & Technology A, 17(4), 1263, 1999
6 Thermal stability of a-SiNx : H films deposited by plasma electron cyclotron resonance
Martinez FL, del Prado A, Bravo D, Lopez F, Martil I, Gonzalez-Diaz G
Journal of Vacuum Science & Technology A, 17(4), 1280, 1999
7 Optical absorption in amorphous hydrogenated silicon nitride thin films deposited by the electron cyclotron resonance plasma method and subjected to rapid thermal annealing
Martinez FL, Martil I, Gonzalez-Diaz G, Bernal-Oliva AM, Gonzalez-Leal JM, Marquez E
Thin Solid Films, 343-344, 433, 1999
8 Fabrication and characterisation of thin low-temperature MBE-compatible silicon oxides of different stoichiometry
Strass A, Bieringer P, Hansch W, Fuenzalida V, Alvarez A, Luna J, Martil I, Martinez FL, Eisele I
Thin Solid Films, 349(1-2), 135, 1999