1 |
Interfacial reactions during sputter deposition of Ta and TaN films on organosilicate glass: XPS and TEM results Wilks JA, Magtoto NP, Kelber JA, Arunachalam V Applied Surface Science, 253(14), 6176, 2007 |
2 |
Theory and experiments on the structure of 7 angstrom alumina films grown on Ni3Al Qin F, Magtoto NP, Kelber JA, Jennison DR Journal of Molecular Catalysis A-Chemical, 228(1-2), 83, 2005 |
3 |
Chemical vapor deposition of tantalum nitride with tert-butylimino tris(diethylamino) tantalum and atomic hydrogen Zhao X, Magtoto NP, Kelber JA Thin Solid Films, 478(1-2), 188, 2005 |
4 |
Adhesion behavior of electroless deposited Cu on Pt/Ta silicate and Pt/SiO2 Garza M, Liu J, Magtoto NP, Kelber JA Applied Surface Science, 222(1-4), 253, 2004 |
5 |
Oxide film growth on Fe(111) and scanning tunneling microscopy induced high electric field stress in Fe2O3/Fe(111) Qin F, Magtoto NP, Garza M, Kelber JA Thin Solid Films, 444(1-2), 179, 2003 |
6 |
Copper interaction with a Ta silicate surface: implications for interconnect technology Zhao X, Magtoto NP, Leavy M, Kelber JA Thin Solid Films, 415(1-2), 308, 2002 |
7 |
Behavior of ultrathin Al2O3 films in very high electric fields: Scanning tunneling microscope-induced void formation and dielectric breakdown Niu C, Magtoto NP, Kelber JA Journal of Vacuum Science & Technology A, 19(4), 1947, 2001 |
8 |
Interactions at the Ni3Al(111)-S-Al2O3 interface at elevated temperatures: Ordering of Al2O3 on S-modified substrate Addepalli S, Magtoto NP, Kelber JA Langmuir, 16(22), 8352, 2000 |
9 |
Infrared Reflection-Absorption Spectroscopy of Adsorbates During the Pt(100)-Mediated Reduction of No with Coadsorption of Co Magtoto NP, Richardson HH Journal of Physical Chemistry, 100(20), 8482, 1996 |