화학공학소재연구정보센터
검색결과 : 10건
No. Article
1 Cu electrodeposition on Ru(0001): Perchlorate dissociation and its effects on Cu deposition
Lei J, Rudenja S, Magtoto N, Kelber JA
Thin Solid Films, 497(1-2), 121, 2006
2 The effects of an iodine surface layer on Ru reactivity in air and during Cu electrodeposition
Liu J, Lei J, Magtoto N, Rudenja S, Garza M, Kelber JA
Journal of the Electrochemical Society, 152(2), G115, 2005
3 Tetrakis(diethylamido) titanium (TDEAT) interactions with SiO2 and Cu substrates
Tong J, Magtoto N, Kelber J
Applied Surface Science, 220(1-4), 203, 2003
4 Ta metallization of Si-O-C substrate and Cu metallization of Ta/Si-O-C multilayer
Tong J, Martini D, Magtoto N, Kelber J
Journal of Vacuum Science & Technology B, 21(1), 293, 2003
5 Copper metallization of hydroxyl-modified amorphous Si : C : H films
Pritchett M, Magtoto N, Tong J, Kelber JA, Zhao X
Thin Solid Films, 440(1-2), 100, 2003
6 Electrodeposition of adherent copper film on unmodified tungsten
Wang C, Lei JP, Bjelkevig C, Rudenja S, Magtoto N, Kelber J
Thin Solid Films, 445(1), 72, 2003
7 Interaction of polymeric Si : C : H films with copper substrates and with deposited Cu adatoms
Tong J, Martini D, Magtoto N, Pritchett M, Kelber J
Applied Surface Science, 187(3-4), 253, 2002
8 Seedless electrodeposition of Cu on unmodified tungsten
Wang C, Lei JP, Rudenja S, Magtoto N, Kelber J
Electrochemical and Solid State Letters, 5(9), C82, 2002
9 Cu wetting and interfacial stability on clean and nitrided tungsten surfaces
Ekstrom BM, Lee S, Magtoto N, Kelber JA
Applied Surface Science, 171(3-4), 275, 2001
10 Effect of surface impurities on the Cu/Ta interface
Chen L, Magtoto N, Ekstrom B, Kelber J
Thin Solid Films, 376(1-2), 115, 2000