검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Measuring acid generation efficiency in chemically amplified resists with all three beams Szmanda CR, Brainard RL, Mackevich JF, Awaji A, Tanaka T, Yamada Y, Bohland J, Tedesco S, Dal'Zotto B, Bruenger W, Torkler M, Fallmann W, Loeschner H, Kaesmaier R, Nealey PM, Pawloski AR Journal of Vacuum Science & Technology B, 17(6), 3356, 1999 |
| 2 |
Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation Brainard RL, Henderson C, Cobb J, Rao V, Mackevich JF, Okoroanyanwu U, Gunn S, Chambers J, Connolly S Journal of Vacuum Science & Technology B, 17(6), 3384, 1999 |