화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Influence of PECVD deuterated SiNx on GaAs MESFETs and GaAs/AlGaAs HBTs
Luo B, Ren F, Wu CS, Pearton SJ, Abernathy CR, MacKenzie KD
Solid-State Electronics, 46(9), 1359, 2002
2 Comparison of the effects of deuterated SiNx films on GaN and GaAs rectifiers
Luo B, Baik K, Ren F, Pearton SJ, MacKenzie KD
Solid-State Electronics, 46(9), 1453, 2002
3 Effects of N-2 or Ar plasma exposure on GaAs/AlGaAs heterojunction bipolar transistors
Hsu CH, Chen CC, Luo B, Ren F, Pearton SJ, Abernathy CR, Lee JW, Mackenzie KD, Sasserath J
Solid-State Electronics, 45(2), 275, 2001
4 Effect of N-2 plasma treatments on dry etch damage in n- and p-type GaN
Kent DG, Lee KP, Zhang AP, Luo B, Overberg ME, Abernathy CR, Ren F, Mackenzie KD, Pearton SJ, Nakagawa Y
Solid-State Electronics, 45(3), 467, 2001
5 Understanding of etch mechanism and etch depth distribution in inductively coupled plasma etching of GaAs
Lee JW, Jeon MH, Devre M, Mackenzie KD, Johnson D, Sasserath JN, Pearton SJ, Ren F, Shul RJ
Solid-State Electronics, 45(9), 1683, 2001
6 Hydrogenation effects on AlGaAs/GaAs heterojunction bipolar transistors
Luo B, Ip K, Ren F, Lee KP, Abernathy CR, Pearton SJ, Mackenzie KD
Solid-State Electronics, 45(10), 1733, 2001
7 Electrical effects of N-2 plasma exposure on dry-etch damage in p- and n-GaN Schottky diodes
Kent DG, Lee KP, Zhang AP, Luo B, Overberg ME, Abernathy CR, Ren F, Mackenzie KD, Pearton SJ, Nakagawa Y
Solid-State Electronics, 45(10), 1837, 2001
8 Low temperature silicon nitride and silicon dioxide film processing by inductively coupled plasma chemical vapor deposition
Lee JW, Mackenzie KD, Johnson D, Sasserath JN, Pearton SJ, Ren F
Journal of the Electrochemical Society, 147(4), 1481, 2000
9 Damage to III-V devices during electron cyclotron resonance chemical vapor deposition
Lee JW, Mackenzie KD, Johnson D, Hahn YB, Hays DC, Abernathy CR, Ren F, Pearton SJ
Journal of Vacuum Science & Technology A, 17(4), 2183, 1999