화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Sub-nanometer resolution XPS depth profiling: Sensing of atoms
Szklarczyk M, Macak K, Roberts AJ, Takahashi K, Hutton S, Glaszczka R, Blomfield C
Applied Surface Science, 411, 386, 2017
2 Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
Macak K, Kouznetsov V, Schneider J, Helmersson U, Petrov I
Journal of Vacuum Science & Technology A, 18(4), 1533, 2000
3 Mechanisms for reactive DC magnetron sputtering of elements with different atomic masses: large area coatings of Al oxide and W oxide
Olsson MK, Macak K
Thin Solid Films, 371(1-2), 86, 2000
4 Epitaxial growth of W-doped VO2/V2O3 multilayer on alpha-Al2O3(110) by reactive magnetron sputtering
Jin P, Tazawa M, Yoshimura K, Igarashi K, Tanemura S, Macak K, Helmersson U
Thin Solid Films, 375(1-2), 128, 2000
5 Growth and characterization of epitaxial films of tungsten-doped vanadium oxides on sapphire (110) by reactive magnetron sputtering
Jin P, Tazawa M, Ikeyama M, Tanemura S, Macak K, Wang X, Olafsson S, Helmersson U
Journal of Vacuum Science & Technology A, 17(4), 1817, 1999
6 High rate reactive de magnetron sputter deposition of Al2O3 films
Olsson MK, Macak K, Helmersson U, Hjorvarsson B
Journal of Vacuum Science & Technology A, 16(2), 639, 1998
7 Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering
Macak K, Nyberg T, Macak P, Olsson MK, Helmersson U, Berg S
Journal of Vacuum Science & Technology A, 16(3), 1286, 1998