화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Study of the energy distribution of the interface trap density in a GeSn MOS structure by numerical simulation of the electrical characteristics
Baert B, Schmeits M, Nguyen ND
Applied Surface Science, 291, 25, 2014
2 Vacuum-ultraviolet reflectance difference spectroscopy for characterizing dielectrics-semiconductor interfaces
Ogata S, Ohno S, Tanaka M, Mori T, Horikawa T, Yasuda T
Thin Solid Films, 519(9), 2830, 2011
3 Influence of initial surface reconstruction on the interface structure of HfO2/GaAs
Yasuda T, Miyata N, Ohtake A
Applied Surface Science, 254(23), 7565, 2008
4 Formation, etching and electrical characterization of a thermally grown gallium oxide on the Ga-face of a bulk GaN substrate
Zhou Y, Ahyi C, Isaacs-Smith T, Bozack M, Tin CC, Williams J, Park M, Cheng AJ, Park JH, Kim DJ, Wang D, Preble EA, Hanser A, Evans K
Solid-State Electronics, 52(5), 756, 2008
5 High temperature NO annealing of deposited SiO2 and SiON films on n-type 4H-SiC
Yano H, Hatayama T, Uraoka Y, Fuyuki T
Materials Science Forum, 483, 685, 2005
6 Electrical properties of oxidized polycrystalline silicon as a gate insulator for n-type 4H-SiC MOS devices
Li P, Rodriguez A, Yarlagadda B, Velampati R, Ayers JE, Jain FC
Solid-State Electronics, 49(12), 2002, 2005
7 Interfacial bonding distribution and energy band structure of (Gd2O3)(1-x)(SiO2)(x) (x=0.5)/GaAs (001) system
Yang JK, Kang MG, Kim WS, Park HH
Applied Surface Science, 237(1-4), 251, 2004
8 Characterizations of SiC/SiO2 interface quality toward high power MOSFETs realization
Ziane D, Bluet JM, Guillot G, Godignon P, Monserrat J, Ciechonski R, Syvajarvi M, Yakimova R, Chen L, Mawby P
Materials Science Forum, 457-460, 1281, 2004
9 Epitaxial growth of 4H-SiC(0 3 (3)over-bar 8) and control of MOS interface
Kimoto T, Hirao T, Fujihira K, Kosugi H, Danno K, Matsunami H
Applied Surface Science, 216(1-4), 497, 2003