화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Plasma-Enhanced Atomic Layer Deposition of TaCx Films Using Tris(neopentyl) Tantalum Dichloride and H-2 Plasma
Kim TH, Eom TK, Kim SH, Kang DH, Kim H, Yu SH, Lim JM
Electrochemical and Solid State Letters, 14(8), D89, 2011
2 Physicochemical and Electrical Properties of LaLuO3/Ge(100) Structures Submitted to Postdeposition Annealings
Radtke C, Krug C, Soares GV, Baumvol IJR, Lopes JMJ, Durgun-Ozben E, Nichau A, Schubert J, Mantl S
Electrochemical and Solid State Letters, 13(5), G37, 2010
3 Low Leakage and High-k Liquid Phase Deposited TiO2 and SiO2/TiO2 Films on (NH4)(2)S-Treated GaAs
Lee MK, Yen CF
Electrochemical and Solid State Letters, 13(10), G87, 2010
4 A Nonvolatile Memory Capacitor Based on a Double Gold Nanocrystal Storing Layer and High-k Dielectric Tunneling and Control Layers
Mikhelashvili V, Meyler B, Yofis S, Salzman J, Garbrecht M, Cohen-Hyams T, Kaplan WD, Eisenstein G
Journal of the Electrochemical Society, 157(4), H463, 2010
5 Improved Electrical Performance and Thermal Stability of HfO2/Al2O3 Bilayer over HfO2 Gate Dielectric AlGaN/GaN MIS-HFETs
Tian F, Chor EF
Journal of the Electrochemical Society, 157(5), H557, 2010
6 Evaluation of emission uniformity of nanocrystalline silicon planar cathodes
Shimawaki H, Murakami K, Neo Y, Mimura H, Wakaya F, Takai M
Journal of Vacuum Science & Technology B, 28(2), C2C49, 2010
7 Deuterium Trapping at the Pt/HfO2 Interface
Driemeier C, Kanter MM, Miotti L, Soares GV, Baumvol IJR
Electrochemical and Solid State Letters, 12(4), G9, 2009
8 Current Transport Mechanism in High-kappa Cerium Oxide Gate Dielectrics Grown on Germanium Substrates
Rahman MS, Evangelou EK, Androulidakis II, Dimoulas A
Electrochemical and Solid State Letters, 12(5), H165, 2009
9 Improvement of the Diffusion Barrier Performance of Ru by Incorporating a WNx Thin Film for Direct-Plateable Cu Interconnects
Sari W, Eom TK, Jeon CW, Sohn H, Kim SH
Electrochemical and Solid State Letters, 12(7), H248, 2009
10 Electrical characteristics of thin boron carbonitride films on Ge(100) and Si(100)
Fitzpatrick PR, Ekerdt JG
Journal of Vacuum Science & Technology B, 27(6), 2366, 2009