검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Scanning Tunneling Microscopy Study of the Multi-Step Deposited and Annealed HfSiOx Gate Dielectric Yew KS, Ang DS, Tang LJ, Cui K, Bersuker G, Lysaght PS Journal of the Electrochemical Society, 158(10), H1021, 2011 |
| 2 |
Identification of interfacial defects in high-k gate stack films by spectroscopic ellipsometry Price J, Bersuker G, Lysaght PS Journal of Vacuum Science & Technology B, 27(1), 310, 2009 |
| 3 |
Metal-gate-induced reduction of the interfacial layer in Hf oxide gate stacks Goncharova LV, Dalponte M, Gustafsson T, Celik O, Garfunkel E, Lysaght PS, Bersuker G Journal of Vacuum Science & Technology A, 25(2), 261, 2007 |
| 4 |
Phase separation in hafnium silicates for alternative gate dielectrics - Influence on the unoccupied states Ramanathan S, McIntyre PC, Luning J, Lysaght PS, Yang Y, Chen ZQ, Stemmer S Journal of the Electrochemical Society, 150(10), F173, 2003 |