검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processing Chang TC, Mor YS, Liu PT, Tsai TM, Chen CW, Chu CJ, Pan FM, Lur W, Sze SM Journal of the Electrochemical Society, 149(10), F145, 2002 |
| 2 |
Effective repair to ultra-low-k dielectric material (k-2.0) by hexamethyidisilazane treatment Mor YS, Chang TC, Liu PT, Tsai TM, Chen CW, Yan ST, Chu CJ, Wu WF, Pan FM, Lur W, Sze SM Journal of Vacuum Science & Technology B, 20(4), 1334, 2002 |
| 3 |
Effects of a new combination of additives in electroplating solution on the properties of Cu films in ULSI applications Hu JC, Chang TC, Wu CW, Chen LJ, Hsiung CS, Hsieh WY, Lur W, Yew TR Journal of Vacuum Science & Technology A, 18(4), 1207, 2000 |