화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Feature Scale Simulation Studies of Teos-Sourced Remote Microwave Plasma-Enhanced Chemical-Vapor-Deposition of Silicon Dioxide - Role of Oxygen-Atom Recombination
Virmani M, Levedakis DA, Raupp GB, Cale TS
Journal of Vacuum Science & Technology A, 14(3), 977, 1996
2 Conformality of SiO2-Films from Tetraethoxysilane-Sourced Remote Microwave Plasma-Enhanced Chemical-Vapor-Deposition
Raupp GB, Levedakis DA, Cale TS
Journal of Vacuum Science & Technology A, 13(3), 676, 1995