검색결과 : 12건
No. | Article |
---|---|
1 |
Conformal metal thin-film coatings in high-aspect-ratio trenches using a self-sputtered rf-driven plasma source Ji L, Kim JK, Ji Q, Leung KN, Chen Y, Gough RA Journal of Vacuum Science & Technology B, 25(4), 1227, 2007 |
2 |
Demonstrations of electronic pattern switching and 10X pattern demagnification in a maskless microion-beam reduction lithography system Ngo VV, Akker B, Leung KN, Noh I, Scott KL, Wilde S Journal of Vacuum Science & Technology B, 21(6), 2297, 2003 |
3 |
Resolution improvement for a maskless microion beam reduction lithography system Jiang XM, Ji Q, Ji LL, Chang A, Leung KN Journal of Vacuum Science & Technology B, 21(6), 2724, 2003 |
4 |
Compact focusing system for ion and electron beams Reijonen J, Ji Q, King TJ, Leung KN, Persaud A, Wilde S Journal of Vacuum Science & Technology B, 20(1), 180, 2002 |
5 |
Improvement in brightness of multicusp-plasma ion source Ji Q, Jiang X, King TJ, Leung KN, Standiford K, Wilde SB Journal of Vacuum Science & Technology B, 20(6), 2717, 2002 |
6 |
Characterization of multicusp-plasma ion source brightness using micron-scale apertures Scott KL, King TJ, Leung KN, Pease RF Journal of Vacuum Science & Technology B, 19(6), 2602, 2001 |
7 |
Pattern generators and microcolumns far ion beam lithography Scott KL, King TJ, Lieberman MA, Leung KN Journal of Vacuum Science & Technology B, 18(6), 3172, 2000 |
8 |
Plasma sources for electrons and ion beams Leung KN Journal of Vacuum Science & Technology B, 17(6), 2776, 1999 |
9 |
Maskless micro-ion-beam reduction lithography Ngo VV, Barletta W, Gough R, Lee Y, Leung KN, Zahir N, Patterson D Journal of Vacuum Science & Technology B, 17(6), 2783, 1999 |
10 |
Plasma source for ion and electron beam lithography Lee Y, Gough RA, Leung KN, Vujic J, Williams MD, Zahir N, Fallman W, Tockler M, Bruenger W Journal of Vacuum Science & Technology B, 16(6), 3367, 1998 |