화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Conformal metal thin-film coatings in high-aspect-ratio trenches using a self-sputtered rf-driven plasma source
Ji L, Kim JK, Ji Q, Leung KN, Chen Y, Gough RA
Journal of Vacuum Science & Technology B, 25(4), 1227, 2007
2 Demonstrations of electronic pattern switching and 10X pattern demagnification in a maskless microion-beam reduction lithography system
Ngo VV, Akker B, Leung KN, Noh I, Scott KL, Wilde S
Journal of Vacuum Science & Technology B, 21(6), 2297, 2003
3 Resolution improvement for a maskless microion beam reduction lithography system
Jiang XM, Ji Q, Ji LL, Chang A, Leung KN
Journal of Vacuum Science & Technology B, 21(6), 2724, 2003
4 Compact focusing system for ion and electron beams
Reijonen J, Ji Q, King TJ, Leung KN, Persaud A, Wilde S
Journal of Vacuum Science & Technology B, 20(1), 180, 2002
5 Improvement in brightness of multicusp-plasma ion source
Ji Q, Jiang X, King TJ, Leung KN, Standiford K, Wilde SB
Journal of Vacuum Science & Technology B, 20(6), 2717, 2002
6 Characterization of multicusp-plasma ion source brightness using micron-scale apertures
Scott KL, King TJ, Leung KN, Pease RF
Journal of Vacuum Science & Technology B, 19(6), 2602, 2001
7 Pattern generators and microcolumns far ion beam lithography
Scott KL, King TJ, Lieberman MA, Leung KN
Journal of Vacuum Science & Technology B, 18(6), 3172, 2000
8 Plasma sources for electrons and ion beams
Leung KN
Journal of Vacuum Science & Technology B, 17(6), 2776, 1999
9 Maskless micro-ion-beam reduction lithography
Ngo VV, Barletta W, Gough R, Lee Y, Leung KN, Zahir N, Patterson D
Journal of Vacuum Science & Technology B, 17(6), 2783, 1999
10 Plasma source for ion and electron beam lithography
Lee Y, Gough RA, Leung KN, Vujic J, Williams MD, Zahir N, Fallman W, Tockler M, Bruenger W
Journal of Vacuum Science & Technology B, 16(6), 3367, 1998