검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Interfacial effects in ZnO nanotubes/needle-structured graphitic diamond nanohybrid for detecting dissolved acetone at room temperature Kathiravan D, Huang BR, Saravanan A, Yeh CJ, Leou KC, Lin IN Applied Surface Science, 426, 630, 2017 |
| 2 |
Improving discharge uniformity of industrial-scale very high frequency plasma sources by launching a traveling wave Chen HL, Tu YC, Hsieh CC, Lin DL, Chang CJ, Leou KC Current Applied Physics, 16(7), 700, 2016 |
| 3 |
Assessment of interface roughness during plasma etching through the use of real-time ellipsometry Han CY, Lai CW, Chao YF, Leou KC, Lin TL Applied Surface Science, 257(7), 2536, 2011 |
| 4 |
Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher Lin C, Leou KC, Huang HM, Hsieh CH Journal of Vacuum Science & Technology A, 27(1), 157, 2009 |
| 5 |
Feedback control of HfO2 etch processing in inductively coupled Cl-2/N-2/Ar plasmas Lin C, Leou KC, Li TC, Lee LS, Tzeng PJ Journal of Vacuum Science & Technology A, 26(5), 1282, 2008 |
| 6 |
Effects of in situ N-2 plasma treatment on etch of HfO2 in inductively coupled Cl-2/N-2 plasmas Lin C, Leou KC, Fan YC, Li TC, Chang KH, Lee LS, Tzeng PJ Journal of Vacuum Science & Technology A, 25(3), 592, 2007 |
| 7 |
Large-scale growth of single-walled carbon nanotubes using cold-wall chemical vapor deposition Shin KY, Lee CT, Kao JS, Kei CC, Chang CM, Hsiao CN, Liang JH, Leou KC, Tsai CH Journal of Vacuum Science & Technology B, 25(6), 1842, 2007 |
| 8 |
Experimental characterization of an inductively coupled acetylene/hydrogen plasma for carbon nanofiber synthesis Lin YY, Wei HW, Leou KC, Lin H, Tung CH, Wei MT, Lin C, Tsai CH Journal of Vacuum Science & Technology B, 24(1), 97, 2006 |
| 9 |
Feedback control of chlorine inductively coupled plasma etch processing Lin C, Leou KC, Shiao KM Journal of Vacuum Science & Technology A, 23(2), 281, 2005 |
| 10 |
Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing Chang CH, Leou KC, Lin C, Lin TL, Tseng CW, Tsai CH Journal of Vacuum Science & Technology A, 21(4), 1183, 2003 |