검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Feature evolution during plasma etching. II. Polycrystalline silicon etching Lane JM, Klemens FP, Bogart KHA, Malyshev MV, Lee JTC Journal of Vacuum Science & Technology A, 18(1), 188, 2000 |
| 2 |
Mask charging and profile evolution during chlorine plasma etching of silicon Bogart KHA, Klemens FP, Malyshev MV, Colonell JI, Donnelly VM, Lee JTC, Lane JM Journal of Vacuum Science & Technology A, 18(1), 197, 2000 |
| 3 |
The role of feedgas chemistry, mask material, and processing parameters in profile evolution during plasma etching of Si(100) Lane JM, Bogart KHA, Klemens FP, Lee JTC Journal of Vacuum Science & Technology A, 18(5), 2067, 2000 |
| 4 |
Mapping of wafer profile to plasma processing conditions: Forward and reverse maps Lane J, Rietman EA, Layadi N, Lee JTC Journal of Vacuum Science & Technology B, 18(1), 299, 2000 |
| 5 |
Role of sidewall scattering in feature profile evolution during Cl-2 and HBr plasma etching of silicon Vyvoda MA, Li M, Graves DB, Lee H, Malyshev MV, Klemens FP, Lee JTC, Donnelly VM Journal of Vacuum Science & Technology B, 18(2), 820, 2000 |
| 6 |
Langmuir probe studies of a transformer-coupled plasma, aluminum etcher Malyshev MV, Donnelly VM, Kornblit A, Ciampa NA, Colonell JI, Lee JTC Journal of Vacuum Science & Technology A, 17(2), 480, 1999 |
| 7 |
Dynamic images of plasma processes : Use of Fourier blobs for endpoint detection during plasma etching of patterned wafers Rietman EA, Lee JTC, Layadi N Journal of Vacuum Science & Technology A, 16(3), 1449, 1998 |
| 8 |
Effects of plasma conditions on the shapes of features etched in Cl-2 and HBr plasmas. I. Bulk crystalline silicon etching Vyvoda MA, Lee H, Malyshev MV, Klemens FP, Cerullo M, Donnelly VM, Graves DB, Kornblit A, Lee JTC Journal of Vacuum Science & Technology A, 16(6), 3247, 1998 |
| 9 |
Preliminary empirical results suggesting the mapping of dynamic in situ process signals to real-time wafer attributes in a plasma etch process Rietman EA, Ibbotson DE, Lee JTC Journal of Vacuum Science & Technology B, 16(1), 131, 1998 |
| 10 |
A new algorithm for real-time thin film thickness estimation given in situ multiwavelength ellipsometry using an extended Kalman filter Galarza CG, Khargonekar PP, Layadi N, Vincent TL, Rietman EA, Lee JTC Thin Solid Films, 313-314, 156, 1998 |