검색결과 : 30건
No. | Article |
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1 |
mRNA destabilization by BTG1 and BTG2 maintains T cell quiescence Hwang SS, Lim J, Yu ZB, Kong P, Sefik E, Xu H, Harman CCD, Kim LK, Lee GR, Li HB, Flavell RA Science, 367(6483), 1255, 2020 |
2 |
Experimental study of effects of different heat sources on the performance of the hybrid multiple-effect diffusion solar still Yeo SD, Lim BJ, Lee GR, Park CD Solar Energy, 193, 324, 2019 |
3 |
Selective Formation of Conductive Network by Radical-Induced Oxidation Koo JY, Yakiyama Y, Lee GR, Lee J, Choi HC, Morita Y, Kawano M Journal of the American Chemical Society, 138(6), 1776, 2016 |
4 |
Aberrant expression of IFN-gamma in Th2 cells from Th2 LCR-deficient mice Hwang SS, Kim K, Lee W, Lee GR Biochemical and Biophysical Research Communications, 424(3), 512, 2012 |
5 |
Defective GATA-3 expression in Th2 LCR-deficient mice Hwang SS, Kim K, Lee GR Biochemical and Biophysical Research Communications, 410(4), 866, 2011 |
6 |
Natural killer T cells promote collagen-induced arthritis in DBA/1 mice Jung S, Shin H, Hong C, Lee H, Park YK, Shin JH, Hong S, Lee GR, Park SH Biochemical and Biophysical Research Communications, 390(3), 399, 2009 |
7 |
Angular dependence Of Si3N4 etch rates and the etch selectivity Of SiO2 to Si3N4 at different bias voltages in a high-density C4F8 plasma Lee JK, Lee GR, Min JH, Moon SH Journal of Vacuum Science & Technology A, 25(5), 1395, 2007 |
8 |
Angular distribution of particles sputtered from Si bottom in a CHF3 plasma Lee JK, Lee GR, Min JH, Moon SH Journal of Vacuum Science & Technology A, 24(5), 1807, 2006 |
9 |
Dependence of SiO2 etch rate on sidewall angle as affected by bottom materials in a high-density CHF3 plasma Lee GR, Min JH, Lee JK, Moon SH Journal of Vacuum Science & Technology B, 24(1), 298, 2006 |
10 |
Contribution of bottom-emitted radicals to the deposition of a film on the SiO2 sidewall during CHF3 plasma etching Lee GR, Min JH, Lee JK, Kang SK, Moon SH Journal of Vacuum Science & Technology A, 23(4), 713, 2005 |