검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Gate oxide process control optimization by x-ray photoelectron spectroscopy in a semiconductor fabrication line Le Gouil A, Cabuil N, Dupeyrat P, Dickson B, Kwan M, Barge D, Gurer E, Doclot O, Royer JC Journal of Vacuum Science & Technology A, 26(4), 805, 2008 |
| 2 |
Poly-Si/TiN/HfO2 gate stack etching in high-density plasmas Le Gouil A, Joubert O, Cunge G, Chevolleau T, Vallier L, Chenevier B, Matko I Journal of Vacuum Science & Technology B, 25(3), 767, 2007 |
| 3 |
Chemical analysis of deposits formed on the reactor walls during silicon and metal gate etching processes Le Gouil A, Pargon E, Cunge G, Joubert O, Pelissier B Journal of Vacuum Science & Technology B, 24(5), 2191, 2006 |