화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Physical Mechanisms behind the Field-Cycling Behavior of HfO2-Based Ferroelectric Capacitors
Pesic M, Fengler FPG, Larcher L, Padovani A, Schenk T, Grimley ED, Sang XH, LeBeau JM, Slesazeck S, Schroeder U, Mikolajick T
Advanced Functional Materials, 26(25), 4601, 2016
2 Anomalous random telegraph noise and temporary phenomena in resistive random access memory
Puglisi FM, Larcher L, Padovani A, Pavan P
Solid-State Electronics, 125, 204, 2016
3 Statistical analysis of random telegraph noise in HfO2-based RRAM devices in LRS
Puglisi FM, Pavan P, Larcher L, Padovani A
Solid-State Electronics, 113, 132, 2015
4 A study on HfO2 RRAM in HRS based on I-V and RTN analysis
Puglisi FM, Pavan P, Padovani A, Larcher L
Solid-State Electronics, 102, 69, 2014
5 RTS noise characterization of HfOx RRAM in high resistive state
Puglisi FM, Pavan P, Padovani A, Larcher L, Bersuker G
Solid-State Electronics, 84, 160, 2013
6 Grain boundary-driven leakage path formation in HfO2 dielectrics
Bersuker G, Yum J, Vandelli L, Padovani A, Larcher L, Iglesias V, Porti M, Nafria M, McKenna K, Shluger A, Kirsch P, Jammy R
Solid-State Electronics, 65-66, 146, 2011
7 Carbon-doped GeTe: A promising material for Phase-Change Memories
Beneventi GB, Perniola L, Sousa V, Gourvest E, Maitrejean S, Bastien JC, Bastard A, Hyot B, Fargeix A, Jahan C, Nodin JF, Persico A, Fantini A, Blachier D, Toffoli A, Loubriat S, Roule A, Lhostis S, Feldis H, Reimbold G, Billon T, De Salvo B, Larcher L, Pavan P, Bensahel D, Mazoyer P, Annunziata R, Zuliani P, Boulanger F
Solid-State Electronics, 65-66, 197, 2011