화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Interpretation of stress variation in silicon nitride films deposited by electron cyclotron resonance plasma
Besland MP, Lapeyrade M, Delmotte F, Hollinger G
Journal of Vacuum Science & Technology A, 22(5), 1962, 2004
2 Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Lapeyrade M, Besland MP, Meva'a C, Sibai A, Hollinger G
Journal of Vacuum Science & Technology A, 17(2), 433, 1999