검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors Langereis E, Roijmans R, Roozeboom F, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 158(2), G34, 2011 |
| 2 |
Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films Potts SE, Keuning W, Langereis E, Dingemans G, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 157(7), P66, 2010 |
| 3 |
Conformality of Plasma-Assisted ALD: Physical Processes and Modeling Knoops HCM, Langereis E, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 157(12), G241, 2010 |
| 4 |
Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes Mackus AJM, Heil SBS, Langereis E, Knoops HCM, van de Sanden MCM, Kessels WMM Journal of Vacuum Science & Technology A, 28(1), 77, 2010 |
| 5 |
Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications Knoops HCM, Baggetto L, Langereis E, van de Sanden MCM, Klootwijk JH, Roozeboom F, Niessen RAH, Notten PHL, Kessels WMM Journal of the Electrochemical Society, 155(12), G287, 2008 |
| 6 |
Low-temperature deposition of TiN by plasma-assisted atomic layer deposition Heil SBS, Langereis E, Roozeboom F, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 153(11), G956, 2006 |
| 7 |
Substrate temperature dependence of the roughness evolution of HWCVD a-Si : H spectroscopic ellipsometry Kessels WMM, Hoefnagels JPM, Langereis E, van de Sanden MCM Thin Solid Films, 501(1-2), 88, 2006 |
| 8 |
Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry Heil SBS, Langereis E, Kemmeren A, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 23(4), L5, 2005 |