검색결과 : 18건
| No. | Article |
|---|---|
| 1 |
Synthesis and optimization of low-pressure chemical vapor deposition-silicon nitride coatings deposited from SiHCl3 and NH3 Cossou B, Jacques S, Couegnat G, King SW, Li L, Lanford WA, Bhattarai G, Paquette M, Chollon G Thin Solid Films, 681, 47, 2019 |
| 2 |
Role of Hydrogen and Nitrogen on the Surface Chemical Structure of Bioactive Amorphous Silicon Oxynitride Films Varanasi VG, Ilyas A, Velten MF, Shah A, Lanford WA, Aswath PB Journal of Physical Chemistry B, 121(38), 8991, 2017 |
| 3 |
Tuning the properties of a complex disordered material: Full factorial investigation of PECVD-grown amorphous hydrogenated boron carbide Nordell BJ, Keck CL, Nguyen TD, Caruso AN, Purohit SS, Lanford WA, Dutta D, Gidley D, Henry P, King SW, Paquette MM Materials Chemistry and Physics, 173, 268, 2016 |
| 4 |
Bromine enrichment in the near-surface region of br-doped NaCl single crystals diagnosed by rutherford backscattering spectrometry Hess M, Krieger UK, Marcolli C, Huthwelker T, Ammann M, Lanford WA, Peter T Journal of Physical Chemistry A, 111(20), 4312, 2007 |
| 5 |
Inductively coupled hydrogen plasma-assisted Cu ALD on metallic and dielectric surfaces Jezewski C, Lanford WA, Wiegand CJ, Singh JP, Wang PI, Senkevich JJ, Lu TM Journal of the Electrochemical Society, 152(2), C60, 2005 |
| 6 |
Molecular caulking - A pore sealing CVD polymer for ultralow k dielectrics Jezewski C, Wiegand CJ, Ye DX, Mallikarjunan A, Liu DL, Jin CM, Lanford WA, Wang GC, Senkevich JJ, Lu TM Journal of the Electrochemical Society, 151(7), F157, 2004 |
| 7 |
Phosphorus atomic layers promoting the chemisorption of highly polarizable transition metallorganics Senkevich JJ, Yang GR, Lu TM, Cale TS, Jezewski C, Lanford WA Advanced Materials, 14(17), A189, 2002 |
| 8 |
Surface segregation of Al of the bilayers of pure Cu and Cu-Al alloy films Wang PI, Murarka SP, Kaminski DA, Bedell S, Lanford WA Journal of the Electrochemical Society, 148(9), G481, 2001 |
| 9 |
Interactions between silica xerogel and tantalum Rogojevic S, Jain A, Wang F, Gill WN, Wayner PC, Plawsky JL, Lu TM, Yang GR, Lanford WA, Kumar A, Bakhru H, Roy AN Journal of Vacuum Science & Technology B, 19(2), 354, 2001 |
| 10 |
Surface cleaning of copper by thermal and plasma treatment in reducing and inert ambients Hymes S, Kumar KS, Murarka SP, Wang W, Lanford WA Journal of Vacuum Science & Technology B, 16(3), 1107, 1998 |