화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Deep-sea bonding
Lane JM
Adhesives Age, 44(10), 27, 2001
2 Feature evolution during plasma etching. II. Polycrystalline silicon etching
Lane JM, Klemens FP, Bogart KHA, Malyshev MV, Lee JTC
Journal of Vacuum Science & Technology A, 18(1), 188, 2000
3 Mask charging and profile evolution during chlorine plasma etching of silicon
Bogart KHA, Klemens FP, Malyshev MV, Colonell JI, Donnelly VM, Lee JTC, Lane JM
Journal of Vacuum Science & Technology A, 18(1), 197, 2000
4 The role of feedgas chemistry, mask material, and processing parameters in profile evolution during plasma etching of Si(100)
Lane JM, Bogart KHA, Klemens FP, Lee JTC
Journal of Vacuum Science & Technology A, 18(5), 2067, 2000