| 1 |
Plasma deposition of fluorocarbon thin films from c-C4F8 using pulsed and continuous rf excitation
Labelle CB, Opila R, Kornblit A
Journal of Vacuum Science & Technology A, 23(1), 190, 2005 |
| 2 |
Investigation of fluorocarbon plasma deposition from c-C4F8 for use as passivation during deep silicon etching
Labelle CB, Donnelly VM, Bogart GR, Opila RL, Kornblit A
Journal of Vacuum Science & Technology A, 22(6), 2500, 2004 |
| 3 |
Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition
Labelle CB, Gleason KK
Journal of Applied Polymer Science, 80(11), 2084, 2001 |
| 4 |
Fourier transform infrared spectroscopy study of thermal annealing behavior of ECR pulsed plasma deposited fluorocarbon thin films from 1,1,2,2-tetrafluoroethane
Labelle CB, Gleason KK
Journal of the Electrochemical Society, 147(2), 678, 2000 |
| 5 |
Surface morphology of PECVD fluorocarbon thin films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane
Labelle CB, Gleason KK
Journal of Applied Polymer Science, 74(10), 2439, 1999 |
| 6 |
Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHCIF2
Labelle CB, Gleason KK
Journal of Vacuum Science & Technology A, 17(2), 445, 1999 |
| 7 |
Fourier transform infrared spectroscopy of effluents from pulsed plasmas of 1,1,2,2-tetrafluoroethane, hexafluoropropylene oxide, and difluoromethane
Labelle CB, Karecki SM, Reif R, Gleason KK
Journal of Vacuum Science & Technology A, 17(6), 3419, 1999 |
| 8 |
Metal Stack Etching Using a Helical Resonator Plasma
Labelle CB, Maynard HL, Lee JT
Journal of Vacuum Science & Technology B, 14(4), 2574, 1996 |
