검색결과 : 7건
No. | Article |
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1 |
대기압 플라즈마를 이용한 결정질 태양전지 표면 식각 공정 황상혁, 권희태, 김우재, 최진우, 신기원, 양창실, 권기청 Korean Journal of Materials Research, 27(4), 211, 2017 |
2 |
펄스변조의 듀티비 변경에 따른 DBD 대기압 플라즈마 특성 연구 박종인, 황상혁, 조태훈, 윤명수, 곽형신, 진기남, 전부일, 최은하, 권기청 Korean Journal of Materials Research, 25(11), 616, 2015 |
3 |
Measurement of Reactive Hydroxyl Radical Species Inside the Biosolutions During Non-thermal Atmospheric Pressure Plasma Jet Bombardment onto the Solution Kim YH, Hong YJ, Baik KY, Kwon GC, Choi JJ, Cho GS, Uhm HS, Kim DY, Choi EH Plasma Chemistry and Plasma Processing, 34(3), 457, 2014 |
4 |
Effect of temperature on the interactions between low bandgap polymer and ionic liquids Attri P, Lee SH, Hwang SW, Kim JIL, Jang W, Kim YB, Park JH, Kwon GC, Choi EH, Kim IT Thermochimica Acta, 579, 15, 2014 |
5 |
Consecutive CVD of Al/Co Bilayers on SiO2 or Alq(3) surfaces at low temperature of 70 degrees C Lee J, Park HJ, Won SH, Jeong KH, Jung HS, Kim C, Bang HJ, Lee CM, Kim JH, Kwon GC, Cho HL, Soh HS, Lee JG Journal of the Electrochemical Society, 154(9), H833, 2007 |
6 |
Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas Lee CH, Kim DH, Lee NE, Kwon GC Journal of Vacuum Science & Technology A, 24(4), 1386, 2006 |
7 |
Effect of high-frequency variation on the etch characteristics of ArF photoresist and silicon nitride layers in dual frequency superimposed capacitively coupled plasma Kim DH, Lee CH, Cho SH, Lee NE, Kwon GC Journal of Vacuum Science & Technology B, 23(5), 2203, 2005 |