검색결과 : 62건
| No. | Article |
|---|---|
| 1 |
Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates Kalam K, Seemen H, Mikkor M, Jogiaas T, Ritslaid P, Tamm A, Kukli K, Kasikov A, Link J, Stern R, Duenas S, Castan H Thin Solid Films, 669, 294, 2019 |
| 2 |
Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers Puttaswamy M, Vehkamaki M, Kukli K, Dimri MC, Kemell M, Hatanpaa T, Heikkila MJ, Mizohata K, Stern R, Ritala M, Leskela M Thin Solid Films, 611, 78, 2016 |
| 3 |
Quasicubic alpha-Fe2O3 nanoparticles embedded in TiO2 thin films grown by atomic layer deposition Tamm A, Seinberg L, Kozlova J, Link J, Pikma P, Stern R, Kukli K Thin Solid Films, 612, 445, 2016 |
| 4 |
Plasmon resonance effect caused by gold nanoparticles formed on titanium oxide films Tamm A, Acik IO, Arroval T, Kasikov A, Seemen H, Marandi M, Krunks M, Mere A, Kukli K, Aarik J Thin Solid Films, 616, 449, 2016 |
| 5 |
Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition Castan H, Garcia H, Duenas S, Bailon L, Miranda E, Kukli K, Kemell M, Ritala M, Leskela M Thin Solid Films, 591, 55, 2015 |
| 6 |
Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes Part M, Tamm A, Kozlova J, Mandar H, Tatte T, Kukli K Thin Solid Films, 553, 30, 2014 |
| 7 |
Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)(3) and H2O Aarik L, Alles H, Aidla A, Kahro T, Kukli K, Niinisto J, Mandar H, Tamm A, Rammula R, Sammelselg V, Aarik J Thin Solid Films, 565, 37, 2014 |
| 8 |
Holmium and titanium oxide nanolaminates by atomic layer deposition Kukli K, Lu J, Link J, Kemell M, Puukilainen E, Heikkila M, Hoxha R, Tamm A, Hultman L, Stern R, Ritala M, Leskela M Thin Solid Films, 565, 165, 2014 |
| 9 |
Holmium titanium oxide thin films grown by atomic layer deposition Kukli K, Kemell M, Dimri MC, Puukilainen E, Tamm A, Stern R, Ritala M, Leskela M Thin Solid Films, 565, 261, 2014 |
| 10 |
The effect of oxygen source on atomic layer deposited Al2O3 as blocking oxide in metal/aluminum oxide/nitride/oxide/silicon memory capacitors Nikolaou N, Ioannou-Sougleridis V, Dimitrakis P, Normand P, Skarlatos D, Giannakopoulos K, Kukli K, Niinisto J, Ritala M, Leskela M Thin Solid Films, 533, 5, 2013 |