1 |
Influence of process pressure on HW-CVD deposited a-Si : H films Jadkar SR, Sali JV, Kshirsagar ST, Takwale MG Solar Energy Materials and Solar Cells, 85(3), 301, 2005 |
2 |
Influence of silane flow on structural, optical and electrical properties of a-Si : H thin films deposited by hot wire chemical vapor deposition (HW-CVD) technique Jadkar SR, Sali JV, Musale DV, Kshirsagar ST, Takwale MG Solar Energy Materials and Solar Cells, 71(2), 153, 2002 |
3 |
Properties of diamond films grown from CH4-CF4-H-2 gas mixture using the hot-filament chemical vapor deposition technique Musale DV, Pavaskar NR, Kshirsagar ST Thin Solid Films, 422(1-2), 20, 2002 |
4 |
The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon (mu c-Si : H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique Jadkar SR, Sali JV, Takwale MG, Musale DV, Kshirsagar ST Thin Solid Films, 395(1-2), 206, 2001 |
5 |
Effect of coupling of radio-frequency plasma on the growth of diamond films in a hot filament reactor Pai MP, Musale DV, Kshirsagar ST, Mitra A, Sainkar SR Thin Solid Films, 322(1-2), 167, 1998 |
6 |
Effect of Chamber Pressure on P-Type Mu-C-SiC-H Thin-Films Prepared by Photo-CVD Dasgupta A, Ghosh S, Kshirsagar ST, Ray S Thin Solid Films, 295(1-2), 37, 1997 |
7 |
Raman-Scattering Studies of Amorphous Sixge1-X-H Alloy-Films Produced by Hot-Filament Assisted Chemical-Vapor-Deposition Technique Kumbhar AA, Kshirsagar ST Thin Solid Films, 302(1-2), 102, 1997 |
8 |
Comparative-Study of Properties of A-Si-H Films Produced by Hot-Filament CVD, Glow-Discharge CVD and Their Hybrid Version Kumbhar AA, Kshirsagar ST Thin Solid Films, 283(1-2), 49, 1996 |