화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters
Fillman RW, Krchnavek RR
Journal of Vacuum Science & Technology B, 27(6), 2869, 2009
2 Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist
Clark N, Vanderslice A, Grove R, Krchnavek RR
Journal of Vacuum Science & Technology B, 24(6), 3073, 2006
3 Bilayer, nanoimprint lithography
Faircloth B, Rohrs H, Tiberio R, Ruoff R, Krchnavek RR
Journal of Vacuum Science & Technology B, 18(4), 1866, 2000
4 Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies
Puscasu I, Boreman G, Tiberio RC, Spencer D, Krchnavek RR
Journal of Vacuum Science & Technology B, 18(6), 3578, 2000