화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Image processing using shape recognition for alignment to damaged registration marks in electron beam lithography
Kratschmer E, Klaus DP, Viswanathan R, Turnidge ML, Reed PL, McPhail B
Journal of Vacuum Science & Technology B, 27(6), 2563, 2009
2 Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping
Guillorn M, Chang J, Fuller N, Patel J, Darnon M, Pyzyna A, Joseph E, Engelmann S, Ott J, Newbury J, Klaus D, Bucchignano J, Joshi P, Scerbo C, Kratschmer E, Graham W, To B, Parisi J, Zhang Y, Haensch W
Journal of Vacuum Science & Technology B, 27(6), 2588, 2009
3 Experimental optimization of the electron-beam proximity effect forward scattering parameter
Rooks M, Belic N, Kratschmer E, Viswanathan R
Journal of Vacuum Science & Technology B, 23(6), 2769, 2005
4 Low stress development of poly(methylmethacrylate) for high aspect ratio structures
Rooks MJ, Kratschmer E, Viswanathan R, Katine J, Fontana RE, MacDonald SA
Journal of Vacuum Science & Technology B, 20(6), 2937, 2002
5 Performance of Zr/O/W Schottky emitters at reduced temperatures
Kim HS, Yu ML, Thomson MGR, Kratschmer E, Chang THP
Journal of Vacuum Science & Technology B, 15(6), 2284, 1997
6 Electron-Beam Microcolumns for Lithography and Related Applications
Chang TH, Thomson MG, Kratschmer E, Kim HS, Yu ML, Lee KY, Rishton SA, Hussey BW, Zolgharnain S
Journal of Vacuum Science & Technology B, 14(6), 3774, 1996
7 Experimental Evaluation of a 20X20 mm Footprint Microcolumn
Kratschmer E, Kim HS, Thomson MG, Lee KY, Rishton SA, Yu ML, Zolgharnain S, Hussey BW, Chang TH
Journal of Vacuum Science & Technology B, 14(6), 3792, 1996
8 Improved Emission Stability of Carburized Hfc(100) and Ultrasharp Tungsten Field Emitters
Yu ML, Hussey BW, Kratschmer E, Chang TH, Mackie WA
Journal of Vacuum Science & Technology B, 13(6), 2436, 1995
9 Miniature Schottky Electron Source
Kim HS, Yu ML, Kratschmer E, Hussey BW, Thomson MG, Chang TH
Journal of Vacuum Science & Technology B, 13(6), 2468, 1995
10 An Electron-Beam Microcolumn with Improved Resolution, Beam Current, and Stability
Kratschmer E, Kim HS, Thomson MG, Lee KY, Rishton SA, Yu ML, Chang TH
Journal of Vacuum Science & Technology B, 13(6), 2498, 1995