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| No. | Article |
|---|---|
| 1 |
Plasma enhanced chemical vapor deposition Si-rich silicon oxynitride films for advanced self-aligned contact oxide etching in sub-0.25 mu m ultralarge scale integration technology and beyond Kim JH, Yu JS, Ku JC, Ryu CK, Oh SJ, Kim SB, Kim JW, Hwang JM, Lee SY, Kouichiro I Journal of Vacuum Science & Technology A, 18(4), 1401, 2000 |