화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 193 nm single layer resist strategies, concepts, and recent results
Nalamasu O, Houlihan FM, Cirelli RA, Timko AG, Watson GP, Hutton RS, Kometani JM, Reichmanis E, Gabor A, Medina A, Slater S
Journal of Vacuum Science & Technology B, 16(6), 3716, 1998
2 Photogenerated Acid-Catalyzed Formation of Phosphonic Phosphoric-Acids by Deprotection of Esters in Polymer-Films
Schilling ML, Katz HE, Houlihan FM, Kometani JM, Stein SM, Nalamasu O
Macromolecules, 28(1), 110, 1995
3 Formation of Polymers Containing 4-Hydroxystyrene via Hydrolysis of 4-((Trimethylsilyl)Oxy)Styrene
Uhrich KE, Reichmanis E, Heffner SA, Kometani JM
Macromolecules, 27(18), 4936, 1994
4 Single-Component Deep-Ultraviolet and X-Ray Resists - The Lithographic Behavior of Poly((2-Methyl-4-T-Butoxycarbonyloxystyrene)Sulfone) and Poly((3-Chloro-4-T-Butoxycarbonyloxystyrene)Sulfone)
Neenan TX, Kumar U, Kometani JM, Novembre AE
Journal of Vacuum Science & Technology B, 11(6), 2779, 1993