검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Phantom exposures of chemically amplified resists caused by acids generated in environmental air in synchrotron radiation lithography Deguchi K, Nakamura J, Kawai Y, Nakanishi K, Okada I, Fukuda M, Oda M, Kochiya H Journal of Vacuum Science & Technology B, 17(5), 2103, 1999 |