검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Evaluation of desorption activation energy of SiBr2 molecules Knizikevicius R Chemical Physics Letters, 512(4-6), 188, 2011 |
| 2 |
Silicon etching in Cl-2 environment Knizikevicius R Applied Surface Science, 253(3), 1581, 2006 |
| 3 |
Evaluation of desorption activation energy of SiF2 molecules Knizikevicius R Chemical Physics Letters, 410(1-3), 177, 2005 |
| 4 |
Real dimensional simulation of SiO2 etching in CF4+H-2 plasma Knizikevicius R Applied Surface Science, 222(1-4), 275, 2004 |
| 5 |
Role of surface instabilities, in mixing and oxidation mechanisms of bilayered Y/Zr films at elevated temperature Pranevicius L, Milcius D, Pranevicius LL, Templier C, Sirvinskaite V, Knizikevicius R Applied Surface Science, 225(1-4), 272, 2004 |
| 6 |
Enhancement of silicon etching rate in XeF2 ambient in the presence of activated polymer Knizikevicius R Applied Surface Science, 228(1-4), 227, 2004 |
| 7 |
Simulation of the loading effect Knizikevicius R Applied Surface Science, 217(1-4), 275, 2003 |
| 8 |
Kinetics of composition of polymeric layer during silicon etching in CF2Cl2 plasma Grigonis A, Knizikevicius R, Rutkuniene Z, Puceta M Applied Surface Science, 199(1-4), 270, 2002 |