검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Ion energy control at substrates during plasma etching of patterned structures Silapunt R, Wendt AE, Kirmse KHR Journal of Vacuum Science & Technology B, 25(6), 1882, 2007 |
| 2 |
Study of C4F8/CO and C4F8/Ar/CO plasmas for highly selective etching of organosilicate glass over Si3N4 and SiC Ling L, Hua X, Li X, Oehrlein GS, Celii FG, Kirmse KHR, Jiang P, Wang YC, Anderson HM Journal of Vacuum Science & Technology A, 22(2), 236, 2004 |
| 3 |
Study of C4F8/N-2 and C4F8/Ar/N-2 plasmas for highly selective organosilicate glass etching over Si3N4 and SiC Hua XF, Wang X, Fuentevilla D, Oehrlein GS, Celii FG, Kirmse KHR Journal of Vacuum Science & Technology A, 21(5), 1708, 2003 |