화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry
Cole DA, Shallenberger JR, Novak SW, Moore RL, Edgell MJ, Smith SP, Hitzman CJ, Kirchhoff JF, Principe E, Nieveen W, Huang FK, Biswas S, Bleiler RJ, Jones K
Journal of Vacuum Science & Technology B, 18(1), 440, 2000
2 Characterization of SiOxNy anti-reflective coatings using SIMS and RBS/HFS
Saleh AA, Rothman JB, Kirchhoff JF, Yota J, Nguyen C
Thin Solid Films, 355-356, 363, 1999
3 Accelerator Based Secondary-Ion Mass-Spectrometry for Impurity Analysis
Anthony JM, Kirchhoff JF, Marble DK, Renfrow SN, Kim YD, Matteson S, Mcdaniel FD
Journal of Vacuum Science & Technology A, 12(4), 1547, 1994