검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Correlation Between Film Properties and Anhydrous HF Vapor Etching Behavior of Silicon Oxide Deposited by CVD Methods Ritala H, Kiihamaki J, Puukilainen E Journal of the Electrochemical Society, 158(6), D399, 2011 |
| 2 |
Deceleration of silicon etch rate at high aspect ratios Kiihamaki J Journal of Vacuum Science & Technology A, 18(4), 1385, 2000 |
| 3 |
Pattern shape effects and artefacts in deep silicon etching Kiihamaki J, Franssila S Journal of Vacuum Science & Technology A, 17(4), 2280, 1999 |