검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Feature scale model of Si etching in SF6/O-2/HBr plasma and comparison with experiments Belen RJ, Gomez S, Kiehlbauch M, Aydil ES Journal of Vacuum Science & Technology A, 24(2), 350, 2006 |
| 2 |
In situ measurement of the ion incidence angle dependence of the ion-enhanced etching yield in plasma reactors Belen RJ, Gomez S, Kiehlbauch M, Aydil ES Journal of Vacuum Science & Technology A, 24(6), 2176, 2006 |
| 3 |
Feature-scale model of Si etching in SF6 plasma and comparison with experiments Belen RJ, Gomez S, Kiehlbauch M, Cooperberg D, Aydil ES Journal of Vacuum Science & Technology A, 23(1), 99, 2005 |
| 4 |
Feature-scale model of Si etching in SF6/O-2 plasma and comparison with experiments Belen RJ, Gomez S, Cooperberg D, Kiehlbauch M, Aydil ES Journal of Vacuum Science & Technology A, 23(5), 1430, 2005 |
| 5 |
Etching of high aspect ratio features in Si using SF6/O-2/HBr and SF6/O-2/Cl-2 plasma Gomez S, Belen RJ, Kiehlbauch M, Aydil ES Journal of Vacuum Science & Technology A, 23(6), 1592, 2005 |
| 6 |
Etching of high aspect ratio structures in Si using SF6/O-2 plasma Gomez S, Belen RJ, Kiehlbauch M, Aydil ES Journal of Vacuum Science & Technology A, 22(3), 606, 2004 |