화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
Dingemans G, van Helvoirt CAA, Pierreux D, Keuning W, Kessels WMM
Journal of the Electrochemical Society, 159(3), H277, 2012
2 Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
Potts SE, Keuning W, Langereis E, Dingemans G, van de Sanden MCM, Kessels WMM
Journal of the Electrochemical Society, 157(7), P66, 2010
3 Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
Sioncke S, Delabie A, Brammertz G, Conard T, Franquet A, Caymax M, Urbanzcyk A, Heyns M, Meuris M, van Hemmen JL, Keuning W, Kessels WMM
Journal of the Electrochemical Society, 156(4), H255, 2009