검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Gradient filling of copper in porous silicon using a non-contact electrochemical method Zhao MR, Shadman FH, Keswani M Applied Surface Science, 445, 505, 2018 |
| 2 |
Treatment of perfluorooctane sulfonic acid (PFOS) using a large-scale sonochemical reactor Gole VL, Fishgold A, Sierra-Alvarez R, Deymier P, Keswani M Separation and Purification Technology, 194, 104, 2018 |
| 3 |
Sonochemical degradation of perfluorinated chemicals in aqueous film-forming foams Rodriguez-Freire L, Abad-Fernandez N, Sierra-Alvarez R, Hoppe-Jones C, Peng H, Giesy JP, Snyder S, Keswani M Journal of Hazardous Materials, 317, 275, 2016 |
| 4 |
Sono-electrochemical recovery of metal ions from their aqueous solutions Dong BF, Fishgold A, Lee P, Runge K, Deymier P, Keswani M Journal of Hazardous Materials, 318, 379, 2016 |
| 5 |
Effect of sound frequency and initial concentration on the sonochemical degradation of perfluorooctane sulfonate (PFOS) Rodriguez-Freire L, Balachandran R, Sierra-Alvarez R, Keswani M Journal of Hazardous Materials, 300, 662, 2015 |
| 6 |
Nanoparticle Adhesion and Removal Introduction Keswani M Particulate Science and Technology, 33(5), 522, 2015 |
| 7 |
Electrochemical Mechanical Removal of Ta Films in Dihydroxybenzene Sulfonic Acid Solutions Containing Potassium Iodate Govindarajan R, Siddiqui S, Keswani M, Raghavan S, Singh DRP, Chawla N Electrochemical and Solid State Letters, 14(4), H156, 2011 |
| 8 |
Use of Urea-Choline Chloride Eutectic Solvent for Back End of Line Cleaning Applications Thanu DPR, Raghavan S, Keswani M Electrochemical and Solid State Letters, 14(9), H358, 2011 |
| 9 |
Post Plasma Etch Residue Removal in Dilute HF Solutions Thanu DPR, Raghavan S, Keswani M Journal of the Electrochemical Society, 158(8), H814, 2011 |