검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Controlled deposition of organic contamination and removal with ozone-based cleanings Claes M, De Gendt S, Kenens C, Conard T, Bender H, Storm W, Bauer T, Mertens P Journal of the Electrochemical Society, 148(3), G118, 2001 |
| 2 |
Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures Vos R, Lux M, Xu K, Fyen W, Kenens C, Conard T, Mertens P, Heyns M, Hatcher Z, Hoffman M Journal of the Electrochemical Society, 148(12), G683, 2001 |