검색결과 : 2건
No. | Article |
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1 |
Depth control of a silicon structure fabricated by 100q keV Ar ion beam lithography Kawasegi N, Morita N, Yamada S, Takano N, Oyama T, Momota S, Taniguchi J, Miyamoto I Applied Surface Science, 253(6), 3284, 2007 |
2 |
Nanoscale fabrication in aqueous KOH solution using tribo-nanolithography Kawasegi N, Park JW, Morita N, Yamada S, Takano N, Oyama T, Ashida K Journal of Vacuum Science & Technology B, 23(6), 2471, 2005 |