화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system
Liddle JA, Blakey MI, Bolan K, Farrow RC, Gallatin GM, Kasica R, Katsap V, Knurek CS, Li J, Mkrtchyan M, Novembre AE, Ocola L, Orphanos PA, Peabody ML, Stanton ST, Teffeau K, Waskiewicz WK, Munro E
Journal of Vacuum Science & Technology B, 19(2), 476, 2001
2 Grid lens approach for high effective emittance in SCALPEL (R)
Moonen D, van Kranen S, Kruit P, Katsap V, Waskiewicz WK
Journal of Vacuum Science & Technology B, 18(6), 3111, 2000