검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system Liddle JA, Blakey MI, Bolan K, Farrow RC, Gallatin GM, Kasica R, Katsap V, Knurek CS, Li J, Mkrtchyan M, Novembre AE, Ocola L, Orphanos PA, Peabody ML, Stanton ST, Teffeau K, Waskiewicz WK, Munro E Journal of Vacuum Science & Technology B, 19(2), 476, 2001 |
| 2 |
Commercialization of SCALPEL masks Farrow RC, Novembre AE, Peabody M, Kasica R, Blakey M, Liddle JA, Werder K, DeMarco R, Ocola L, Rutberg L, Saunders T, Unruh J, Qian F, Smith M Journal of Vacuum Science & Technology B, 16(6), 3582, 1998 |
| 3 |
Metrology of scattering with angular limitation projection electron lithography masks Liddle JA, Blakey MI, Saunders T, Farrow RC, Fetter LA, Knurek CS, Kasica R, Novembre AE, Peabody ML, Tennant DM, Windt DL, Postek M Journal of Vacuum Science & Technology B, 15(6), 2197, 1997 |