화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Measurement of desorbed products during organic polymer thin film etching by plasma beam irradiation
Kurihara K, Karahashi K, Egami A, Nakamura M
Journal of Vacuum Science & Technology A, 24(6), 2217, 2006
2 Etching yield Of SiO2 irradiated by F+, CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV
Karahashi K, Yanai K, Ishikawa K, Tsuboi H, Kurihara K, Nakamura M
Journal of Vacuum Science & Technology A, 22(4), 1166, 2004
3 Measurements of desorbed products by plasma beam irradiation on SiO2
Kurihara K, Yamaoka Y, Karahashi K, Sekine M
Journal of Vacuum Science & Technology A, 22(6), 2311, 2004
4 Transitional change to amorphous fluorinated carbon film deposition under energetic irradiation of mass-analyzed carbon monofluoride ions on silicon dioxide surfaces
Ishikawa K, Karahashi K, Tsuboi H, Yanai K, Nakamura M
Journal of Vacuum Science & Technology A, 21(4), L1, 2003
5 Desorption species from fluorocarbon film by Ar+ ion beam bombardment
Hayashi M, Karahashi K
Journal of Vacuum Science & Technology A, 18(4), 1881, 2000