검색결과 : 5건
No. | Article |
---|---|
1 |
Measurement of desorbed products during organic polymer thin film etching by plasma beam irradiation Kurihara K, Karahashi K, Egami A, Nakamura M Journal of Vacuum Science & Technology A, 24(6), 2217, 2006 |
2 |
Etching yield Of SiO2 irradiated by F+, CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV Karahashi K, Yanai K, Ishikawa K, Tsuboi H, Kurihara K, Nakamura M Journal of Vacuum Science & Technology A, 22(4), 1166, 2004 |
3 |
Measurements of desorbed products by plasma beam irradiation on SiO2 Kurihara K, Yamaoka Y, Karahashi K, Sekine M Journal of Vacuum Science & Technology A, 22(6), 2311, 2004 |
4 |
Transitional change to amorphous fluorinated carbon film deposition under energetic irradiation of mass-analyzed carbon monofluoride ions on silicon dioxide surfaces Ishikawa K, Karahashi K, Tsuboi H, Yanai K, Nakamura M Journal of Vacuum Science & Technology A, 21(4), L1, 2003 |
5 |
Desorption species from fluorocarbon film by Ar+ ion beam bombardment Hayashi M, Karahashi K Journal of Vacuum Science & Technology A, 18(4), 1881, 2000 |