1 |
The effect of target aging on the structure formation of zinc oxide during reactive sputtering Severin D, Kappertz O, Nyberg T, Berg S, Wuttig M Thin Solid Films, 515(7-8), 3554, 2007 |
2 |
Towards understanding the superior properties of transition metal oxynitrides prepared by reactive DC magnetron sputtering Venkataraj S, Severin D, Mohamed SH, Ngaruiya J, Kappertz O, Wuttig M Thin Solid Films, 502(1-2), 228, 2006 |
3 |
Dynamic behaviour of the reactive sputtering process Kubart T, Kappertz O, Nyberg T, Berg S Thin Solid Films, 515(2), 421, 2006 |
4 |
Reactive direct current magnetron sputtering of tungsten oxide: A correlation between film properties and deposition pressure Salinga C, Kappertz O, Wuttig M Thin Solid Films, 515(4), 2760, 2006 |
5 |
Reactive sputter deposition of zinc oxide: Employing resputtering effects to tailor film properties Kappertz O, Drese R, Ngaruiya JM, Wuttig M Thin Solid Films, 484(1-2), 64, 2005 |
6 |
Effect of heat treatment on structural, optical and mechanical properties of sputtered TiOxNy films Mohamed SH, Kappertz O, Niemeier T, Drese R, Wakkad MM, Wuttig M Thin Solid Films, 468(1-2), 48, 2004 |
7 |
Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films Mohamed SH, Kappertz O, Ngaruiya JM, Pedersen TPL, Drese R, Wuttig M Thin Solid Films, 429(1-2), 135, 2003 |
8 |
Correlation between structure, stress and deposition parameters in direct current sputtered zinc oxide films Kappertz O, Drese R, Wuttig M Journal of Vacuum Science & Technology A, 20(6), 2084, 2002 |
9 |
Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering Venkataraj S, Geurts J, Weis H, Kappertz O, Njoroge WK, Jayavel R, Wuttig M Journal of Vacuum Science & Technology A, 19(6), 2870, 2001 |