검색결과 : 17건
| No. | Article |
|---|---|
| 1 |
Protein imaging on a semiconducting substrate: A scanning tunnelling microscopy investigation Campbell SA, Smith JR, Jungblut H, Lewerenz HJ Journal of Electroanalytical Chemistry, 599(2), 313, 2007 |
| 2 |
Photoactive silicon-based nanostructure by self-organized electrochemical processing Aggour M, Skorupska K, Pereira TS, Jungblut H, Grzanna J, Lewerenz HJ Journal of the Electrochemical Society, 154(9), H794, 2007 |
| 3 |
Initial surface topography changes during divalent dissolution of silicon electrodes Jakubowicz J, Jungblut H, Lewerenz HJ Electrochimica Acta, 49(1), 137, 2003 |
| 4 |
High resolution surface analysis of Si roughening in dilute ammonium fluoride solution Lewerenz HJ, Aggour M, Murrell C, Jakubowicz J, Kanis M, Campbell SA, Cox PA, Hoffmann P, Jungblut H, Schmeisser D Journal of Electroanalytical Chemistry, 540, 3, 2003 |
| 5 |
Initial stages of structure formation on silicon electrodes investigated by photoelectron spectroscopy using synchrotron radiation and in situ atomic force microscopy Lewerenz HJ, Aggour M, Murrell C, Kanis M, Jungblut H, Jakubowicz J, Cox PA, Campbell SA, Hoffmann P, Schmeisser D Journal of the Electrochemical Society, 150(3), E185, 2003 |
| 6 |
Mechanism of initial structure formation on highly doped n-Si (111) Jungblut H, Jakubowicz J, Schweizer S, Lewerenz HJ Journal of Electroanalytical Chemistry, 527(1-2), 41, 2002 |
| 7 |
Microroughness and composition of cyanide-treated CuInS2 Weber M, Scheer R, Lewerenz HJ, Jungblut H, Sturkel U Journal of the Electrochemical Society, 149(1), G77, 2002 |
| 8 |
Electrochemical interface modification of CuInS2 thin films Aggour M, Storkel U, Murrell C, Campbell SA, Jungblut H, Hoffmann P, Mikalo R, Schmeisser D, Lewerenz HJ Thin Solid Films, 403-404, 57, 2002 |
| 9 |
Photo-induced ultrathin electropolishing layers on silicon: formation, composition and structural properties Jungblut H, Lewerenz HJ Applied Surface Science, 168(1-4), 194, 2000 |
| 10 |
Surface analysis of the electropolishing layer on Si(111) in ammonium fluoride solution Lewerenz HJ, Jungblut H, Rauscher S Electrochimica Acta, 45(28), 4615, 2000 |